精准温度测量，保障晶体生长工艺稳定性

保证高纯硅片生产过程中的温度均匀性与稳定性。

实现光电器件用晶体的精准生长控制。

适用于对温度精度与可重复性要求极高的科研设备。

精确测量并调控用于晶体生长的高温炉体温度。

提供复杂玻璃材料生产过程中的温度传感支持。

确保 LED 基底成型过程中的温度最佳窗口。

控制光伏材料制造流程中关键温区的温度稳定性。

• Czochralski (CZ) Process:
Pyrometers are commonly aligned to measure the temperature of the growing crystal or the melt surface through viewports in the reactor chamber. This allows for precise control of the crystal pulling and growth rate, which is crucial for producing high-quality single crystals

• Physical Vapor Transport (PVT) Systems:
In PVT reactors (used for materials like SiC), pyrometers are positioned to monitor the temperature profile of the crystal growth zone, often with motorized alignment for remote, real-time adjustments

• Polysilicon and Multi-crystalline Silicon Growth - Pyrometers are used to monitor:
→ Heater temperature: Mounted to view the heater or heating elements, ensuring the correct thermal environment
→ Silicon melt surface temperature: Focused on the melt through a dedicated optical path or viewport, often using dual (ratio) pyrometers to compensate for window contamination and variable emissivity
→ Liquid-solid interface temperature: Advanced setups may use pyrometers to track the temperature at the moving interface, which is vital for controlling the solidification front and crystal quality